E-Beam Lithography : E-BEam Lithography with 10nm Linewith on PMMA (4/11/05) Baseline Process for 20-30nm Linewidth E-Beam Lithography (2/9/05) Optical Lithography : Optimization of Optical Lithography Condition (4/11/05)
PECVD: Deposition of High-Quality, Nanometer-Thick Si3N4 Films Using an ECR PECVD System
RIE: III-V Compound Semiconductor Dry Etching GaAs Nanostructure Etching / E-beam Dosage/Line-width/Sidewall-profile