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Nanofabrication Facility
 Elionix ELS-7000
CNS ID: EL-4
Make: Elionix
Model: ELS-7000
Category: Lithography
Name: Elionix ELS-7000
Location: LISE - Cleanroom G07
 
 
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More Info: 
Ultra high precision 100 keV Electron Beam Lithography System. Minimum line width 7nm; maximum wafer size 8". Laser interferometer stage with stitching accuracy 30nm.
Comments: 
 
Contact Info:
Yuan Lu
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-495-2822
ylufas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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