| CNS Training Events - Registration Page |
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Registration is currently open for the following training sessions:
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Monday, November 23rd, 2009 |
Training - FESEM training - B15I
SEM training to use the Ultra55 and Supra55VP FESEMs. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1 to 4:30 PM |
4 |
1 |
Register!
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Training - TEM sample preparation - sample "sandwich" making and wet Diamond Saw - B15A
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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11am-12pm |
3 |
FULL |
Registration Closed
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Training - TEM sample preparation for materials cross sections - disk cutter - B15A
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1-2pm |
3 |
FULL |
Registration Closed
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Training - Unaxis ICP RIE - LISE Cleanroom, meet at the tool
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30pm - 3:00pm |
3 |
1 |
Register!
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Tuesday, November 24th, 2009 |
Training - Asylum AFM - 1st course (basic AFM imaging operation) - LISE-G04
Basic AFM imaging course, including AFM fundamental, cantilever selection, imaging modes, operation procedures and physics behind, and basic imaging processing skills.
please download/read the operation manual on line, http://www.cns.fas.harvard.edu/facilities/material_manuals.php |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00am to 12:00pm |
4 |
FULL |
Registration Closed
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Training - INTRODUCTORY FIB CROSSBEAM (FIB/SEM) TRAINING - B15H
Introduction to the FIB operation of the Crossbeam system by Zeiss. Requires experience with Zeiss SmartSEM software. Must have Zeiss SMARTSEM Training prior to signing up. READ SOP PRIOR TO CLASS. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1 pm to 5 pm |
3 |
FULL |
Registration Closed
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Training - LISE clean room orientation - LISE CR (G07); in the hallway
Please bring a copy of the Orientation Form to be filled out from the CNS website. Gowning protocol and tour of the cleanroom are covered. This event takes ~1hr. We meet right in the hallway at G07. Please bring a copy of the Orientation Form to be filled out from the CNS website. |
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Time |
Max Attendees |
Available |
Open Event! |
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2pm |
6 |
2 |
Register!
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Training - LISE/CNS Safety Training - LISE 311
Training required for all enrolling CNS/NNIN Users (except NNIN/C Computational Only or Remote Only Users) |
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Time |
Max Attendees |
Available |
Open Event! |
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10:00am - 12:00pm |
12 |
7 |
Register!
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Training - STS PECVD - LISE Cleanroom, meet at the tool
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30pm - 3:00pm |
3 |
2 |
Register!
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Training - Thermal evaporator training (TE-3, 4 & 5) - LISE cleanroom (G07); PVD Bay
Use of the Sharon TE-3 for metal thin film deposition is taught. This training takes ~3hr, including pumping down the system. We meet promptly right at the machine in the CR PVD Bay. After the training you will have access to TE-3, 4 and 5. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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11am - 2pm |
3 |
2 |
Register!
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Training - WITec Confocal Raman Microscope - LISE-G04
Basic training course on the WITec confocal Raman microscope, including the basic physics of confocal Raman, the operation procedure, spectrum/imaging process and data analysis skills. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm to 3:30pm |
4 |
3 |
Register!
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Wednesday, November 25th, 2009 |
Training - Metrology tool for Nanofabrication process (1st course) - LISE-G07, Metrology bay in the clean-room
Basic metrology tools training, including Stylus profilometer, Single wavelength Elliosometer, 4 point probe system, Probe station and Electrical measurement. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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10:00am to 12:00pm |
4 |
FULL |
Registration Closed
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Training - Metrology tool for Nanofabrication process (Advanced course) - LISE-G07, Metrology Bay in the clean-room
Advanced metrology tool training, including JAWoollam Spec. Ellipsometer, Veeco Optical Profiler, or Veeco AFM. Since each tool training may take 1.5~2 hours , user should email JD (jdeng@cns.fas.harvard.edu) to arrange the training schedule after sighing up. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30pm to 5:00pm |
2 |
FULL |
Registration Closed
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Thursday, November 26th, 2009 |
Training - Asylum AFM - 2nd course (AFM qualification, and advanced AFM modes) - LISE-G04
Advanced AFM course, including 2 sections:
1) AFM certification. User will operate the AFM and pass the qualification to get the AFM access.
2) Based on the requirement and timing, some advanced AFM techniques will be introduced, including conductive AFM, MFM, Force measurement, fluid AFM, nanolithography...
Note, users have to read through the operation manual of Asylum AFM http://www.cns.fas.harvard.edu/facilities/material_manuals.php |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00pm to 4:00 pm |
3 |
2 |
Register!
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Training - LISE Cleanroom Orientation - LISE G07 (in front of LISE Cleanroom entrance)
This orientation is required in order to become qualified as a CNS LISE Cleanroom User. Please bring the Cleanroom Orientation Form as requested in the Nanofabrication Facility Use page in the User Info section of the CNS web site. Please see that page for the additional requirements for qualification as a CNS LISE Cleanroom User. |
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Time |
Max Attendees |
Available |
Open Event! |
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12:45-1:45 |
20 |
20 |
Register!
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Friday, November 27th, 2009 |
Training - Disco-Dicing Saw training - LISE-G06
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00am -12:00pm |
3 |
3 |
Register!
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Training - WITec NSOM/AFM advanced training - LISE-G04
Advanced training course on the WITec system, mainly focusing on the near-filed scanning optical microscope (NSOM) and AFM, including the basic physics of NSOM, the operation procedure, data analytical skills... The WITec Raman training is required before this training. It may take 2-4 courses to get the final NSOM certification. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 - 4:30pm |
3 |
1 |
Register!
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Monday, November 30th, 2009 |
Training - INTRODUCTORY FIB CROSSBEAM (FIB/SEM) TRAINING: Monday, November 30th, 2009 @ 1 pm to 5 pm - B15H
Pre-requisites: Zeiss SMARTSEM Experience and Review SOP for Zeiss NVision 40. Introductory training on FIB/SEM. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1 pm to 5 pm |
3 |
1 |
Register!
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Training - photolithography - LISE-G07 in the photolithography bay
Basic photolithography processes and skills, including process design rule, mask design, photoresist coating, wafer baking, UV exposure (mask-aligner-ABM, Suss-MJB3, and Suss MJB4), development, and process 'tricks'... Suss MA6 training will be scheduled after this training. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30pm to 4:30pm |
4 |
FULL |
Registration Closed
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