Focused Ion Beam systems use a finely focused beam of gallium ions to remove nanometers of material or deposit metals and insulators using gaseous precursors. These tools were originally developed for the semiconductor industry but have been readily implemented in the biological sciences, material sciences, applied physics, and geology fields. At the CNS, we offer two FIB-SEM dual beam systems:
FEI Helios Nanolab 660 Dualbeam FIB-SEM
The FEI Helios 660 focused ion beam and scanning electron microscope is available to perform direct etching and milling of patterns. This tool enables rapid preparation of thin samples for TEM and needles for atom probe tomography. In addition, metal or oxide pattern deposition can be performed. An Omniprobe mechanical probe permits the lift-out of TEM and Atom Probe specimens.
Zeiss NVision 40 FIB-SEM Dual Beam with Cryo Stage
The Zeiss NVision 40 CrossBeam with Focused Ion Beam (FIB) and high-resolution field emission SEM using a crossover-free Gemini column.
The NPVE lithography package allows advanced patterning, milling and deposition. An Omniprobe mechanical probe permits the lift-out of TEM specimens. An EDAX energy dispersive x-ray spectrometer allows the user to determine the chemical composition of the specimen. Both heating and cooling (cryo) stages are available for use.